2019

  • A new business site started construction
  • Wafer Works (Shanghai) Co., Ltd. (WWXS) was restructured and established as a joint stock limited company
2019

2018

  • The Company was listed as an A-class supported firm in the G60 Science and Technology Innovation Corridor by the Songjiang District Government
  • The Company was awarded the Shanghai Standard Enterprise with Harmonious Labor Relations
  • The Company achieved a record-high output of 5-inch polished silicon wafers, that is, 400,258
  • The Company served as executive member of the seventh council of China Electronics Materials Industry Association
  • The Company served as vice president of the fifth council of Semiconductor Materials Branch, China Electronics Materials Industry Association
  • Wafer Works (Zhengzhou) Corporation (WWXZ) became operational
2018

2017

  • Wafer Works (Zhengzhou) Corporation (WWXZ) started construction
  • The Company was identified as High-tech Enterprise in Shanghai (again)
 

2016

  • Wafer Works (Yangzhou) Corporation (WWXY) started operation
2016

2015

  • The Company was identified as SME that Uses innovative technologies to Produce Novel and Unique Products in Shanghai
 

2014

  • The Company was recognized as a pilot enterprise for patent-related work in Shanghai, and was funded by the Shanghai Special Fund Program for Standardization Promotion
  • The Company became the controlling shareholder of Yangzhou Hengyang, which was renamed Wafer Works (Yangzhou) Corporation (WWXY), laying a solid groundwork for the Company to increase production capacity
 

2013

  • The project Heavily doped silicon substrate for epitaxy was selected into the National Special Fund Program for Integrated Circuit Industry R&D, and the project Transformation of Silicon Wafer Polishing Technology was listed as the Shanghai Key Technological Transformation Project.
  • Yangzhou Hengyang plant obtained the ISO9001:2008 quality management system certification (from DQS-UL)
 

2012

  • The Company passed the pre-examination of cleaner production in Shanghai, and was accredited as Shanghai Enterprise Technology Center
 

2011

  • The project Heavily doped silicon substrate for epitaxy with Epitaxial Substrate was selected into the National Special Fund Program for Integrated Circuit Industry R&D, and the project Transformation of Silicon Wafer Polishing Technology was listed as the Shanghai Key Technological Transformation Project
  • The Company was awarded the 2010 Shanghai High-tech Achievement Transformation Project (Top 100) with its STMicroelectronics audit and introduction into the KM (knowledge management) system of international customers
  • The Company invested and established Yangzhou Hengyang plant
 

2010

  • The Company was awarded the Shanghai Foreign Invested Enterprise with Advanced Technology, the Shanghai Foreign Invested Enterprise with Double Excellence, the second prize of Shanghai Quality Technology Award, the Shanghai Key New Product, the second prize of Songjiang District Science and Technology Progress Award of Shanghai, the third prize of the Quality Technology Award of China Association for Quality, and the project certificate under Shanghai Torch Programme
 

2008

  • The Company was recognized as High-tech Enterprise in Shanghai and awarded the China Semiconductor Innovation Product and Technology Certificate; it completed data migration to ERP and Lotus Notes; and its project Silicon Wafer with Thin Epitaxial Substrate was selected into the National Special Fund Program for Integrated Circuit Industry R&D
 

2006

  • The Company was rated as Key Enterprise of Songjiang District, Shanghai in 2005
  • Wafer Works Epitaxial Corporation was launched
2006

2005

  • The Company won the title of Shanghai Technologically Advanced Enterprise in 2004
 

2004

  • Wafer Works Corporation changed its name to Wafer Works (Shanghai) Co., Ltd. (WWXS)
2004

2003

  • The Company was honored the 2002 National Foreign Invested Enterprise with Double Excellence
 

2000

  • With increase in capital and share by both Chinese and foreign parties, the Company was restructured into Jinghua Electronic Materials Co., Ltd.
2000

1997

  • The Company became the first in the domestic industry to obtain the ISO9002 quality certification
  • The Company became the first in the domestic industry to win the title of Shanghai High-tech Enterprise
1997

1996

  • The Company won the Best Supplier award from the US company Rohm
1996

1995

  • The Company started supplying polished wafers in batches, with the largest output of polished wafers for IC in China, and it was the first Chinese manufacturer to export Prime Grade wafers in batches
 

1994

  • Shanghai Jinghua Electronic Technology Co., Ltd. was jointly established with the US company Helitek International Company Limited
1994

1984

  • Basic silicon materials were exhibited at the Shanghai Microelectronics Technology and Application Exhibition in Shanghai Center. Chief Engineer Ge Tao introduced in detail to Deng Xiaoping the development of silicon materials in Shanghai.
1984

1983

  • N-type, IC-level monocrystalline was honored the National Excellent New Product Award
 

1982

  • Heavily antimony doped single crystal won the National Excellent New Product Award
 

1960

  • The Company’s predecessor Shanghai Second Smelters Factory 901 was established, which was the first Chinese manufacturer to accomplish the industrial production of silicon materials
 

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