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Excellent Technical Standard Award by the Subcommittee on Materials of the National Technical Committee for Standardization of Semiconductor Equipment and Materials Test method for the content of surface metal elements on silicon wafers – Inductively coupled plasma mass spectrometry |
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Excellent Technical Standard Award by the Subcommittee on Materials of the National Technical Committee for Standardization of Semiconductor Equipment and Materials Test method for the oxygen concentration in silicon materials – Inert gas fusion infrared detection method |
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Member of the Fifth Council of the Nonferrous Metals Society of Shanghai |